Remote-plasma-CVD method for coating or for treating large-surface substrates and apparatus for performing same

An apparatus for coating or treating a substrate by means of a remote plasma CVD process, said apparatus comprising

• a reaction chamber for the substrate to be treated or coated;
• means for feeding a reactant gas into the reaction chamber;
• means for exciting an excitation gas to form a plasma in the excitation gas, wherein said means for exciting the excitation gas comprises a plurality of modular plasma source devices arranged, either in a linear arrangement or in a two-dimensional planar array, over said substrate;
• means for feeding the excitation gas into the reaction chamber with the reactant gas in the presence of the substrate;
• means for removing exhaust gas from the reaction chamber;
• and
• means for moving said substrate in a substrate motion direction relative to said plasma source devices, wherein said substrate motion direction is at an angle (α) less than 90° relative to a long axis of said arrangement or array of said plasma source devices, whereby edge effects causing spatial variations in coating properties are minimized.