Exposure apparatus and device manufacturing method including measuring position and/or displacement of each of a base and a stage with respect to a support
AssigneeCanon Kabushiki Kaisha
InventorTakao Ukaji
Life of this patent
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Abstract
An exposure apparatus includes a projection optical system, a barrel supporting member for supporting the projection optical system, a stage being movable relative to the projection optical system, a base for supporting the stage, a base measuring system for measuring at least one of a position and a displacement of the base with respect to the barrel supporting member, and a stage measuring system for measuring at least one of a position and a displacement of the stage with respect to the barrel supporting member.
Claims33
An exposure apparatus, comprising:
- a projection optical system;
- a barrel supporting member for supporting said projection optical system;
- a stage being movable relative to said projection optical system;
- a base for supporting said stage, wherein said base is isolated from said barrel supporting member with respect to vibration;
- base measuring means for measuring at least one of a position and a displacement of said base with respect to said barrel supporting member;
- and
- stage measuring means for measuring at least one of a position and a displacement of said stage with respect to said barrel supporting member.
A device manufacturing method, comprising the steps of:
- registering a barrel support for supporting a projection optical system, with respect to a predetermined position;
- moving a stage relative to the projection optical system;
- supporting the stage by a base;
- isolating the base from the barrel support with respect to vibration;
- measuring at least one of a position and a displacement of the base with respect to the barrel supporting member;
- measuring at least one of a position and a displacement of the stage with respect to the barrel supporting member;
- and
- transferring a reticle pattern to a wafer placed on the stage to manufacture a device.
An exposure apparatus, comprising:
- a projection optical system;
- a barrel supporting member for supporting said projection optical system;
- a stable movable relative to said projection optical system;
- a base for supporting said stage;
- a first mount for supporting said barrel supporting member;
- a second mount for supporting said base;
- and
- a base measuring system for measuring at least one of a position and a displacement of said base with respect to said barrel supporting member.
Dependencies are inferred from the claim text.