Yttria-stabilized zirconia feed material

Abstract

A method is provided for physical vapor deposition of ceramic thermal barrier coatings and articles made therefrom Impurity levels in conventional yttria stabilized zirconia source materials have caused undesired spitting (eruptions) due to a combined effect of various impurities thereby requiring relatively low evaporation rates to control the level of spitting during the process. The present method provides a high purity source material having a purity index sufficiently low to result in reduced spitting in the vapor deposition process and to permit in evaporation rates. Reducing the density of the source material has also been found to reduce spitting. The method permits higher processing rates and/or reduced levels of spitting.

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