Method of manufacturing semicustom reticles using reticle primitives and reticle exchanger
AssigneeAgere Systems Guardian Corp.
InventorThomas E. Adams
Life of this patent
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Abstract
A system for, and method of, manufacturing a semicustom reticle for an integrated circuit (IC) and an IC manufactured by the system or the method. In one embodiment, the system includes: (1) a library of reticle primitives, at least two of the reticle primitives containing patterns corresponding to portions of a layer to be created by the semicustom Reticle and (2) exposure equipment that employs the at least two of the recticle primitives to create an image of the patterns on the semicustom reticle to allow the semicustom reticle to create the layer in a single lithographic step.
Claims8
A method of manufacturing a semicustom reticle for an integrated circuit (IC), comprising:
- selecting, from a library of reticle primitives, at least two of said reticle primitives containing patterns corresponding to portions of a layer to be created by said semicustom reticle;
- employing exposure equipment having a recticle exchanger to said at least two of said reticle primitives to create an image of said patterns on said semicustom reticle, said reticle exchanger automatically exchanging said at least two of said reticle primitives;
- and
- employing said semicustom reticle to create an image of said patterns on said IC and thereby begin to form a layer of said IC.
A method of manufacturing a semicustom reticle, comprising:
- (a) coating a transparent substrate with an opaque material;
- (b) depositing a photoresist layer over said opaque material;
- (c) exposing a first portion of said photoresist layer, using exposure equipment having a recticle exchanger, to transfer a first pattern from a first reticle primitive, said first pattern corresponding to a device level of an integrated circuit (IC);
- (d) repeating (c) to transfer a second pattern from a second reticle primitive onto a second portion of said photoresist layer, said second pattern corresponding to said device level of said IC, said reticle exchanger automatically exchanging said first and second reticle primitives;
- (e) developing said photoresist layer to remove exposed portions of said photoresist layer;
- (f) etching said first and second pattern into said opaque material;
- and
- (g) removing remaining portions of said photoresist material, said semicustom reticle employable to create an image of said first and second patterns on said IC and thereby begin to form said device level of said IC.
Dependencies are inferred from the claim text.