Advance metallization process
AssigneeMicron Technology, Inc.
InventorsManny Ma, Trung Doan, Jeff Zhiqiang Wu
Life of this patent
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Abstract
An exemplary implementation of the present invention includes a method for forming conductive lines fabricated in a semiconductor device, the method comprising the steps of forming a first layer of patterned conductive lines, having substantially vertical sidewalls, on a supporting material; of forming insulative spacers about the substantially vertical sidewalls; of forming trenches into the supporting material that align to the insulative spacers; and of forming a second layer of patterned conductive lines such that each line is at least partially embedded within a corresponding trench. Preferably, the conductive lines, formed by a double metal process, are recessed into a supporting material that has a substantially planar surface.
Claims7
A double metal process for forming conductive lines fabricated in a semiconductor device, said process comprising the steps of:
- forming a first metal layer on a material having a substantially planar surface;
- forming a hard mask layer over said first metal layer;
- patterning and etching said hard mask layer and said first metal layer to form a patterned hard mask overlying a first plurality of patterned metal lines;
- forming insulative spacers about said patterned hard mask and said patterned metal lines;
- forming trenches into said material along side said insulative spacers;
- forming a second metal layer that covers said patterned hard mask, said insulative spacers and at least partially fills said trenches;
- removing a portion of said second metal layer covering said hard mask to form a second plurality of patterned metal lines wherein each metal line of said second plurality of patterned metal lines is completely recessed within a corresponding trench;
- wherein said step of forming a first metal layer and said step of forming a second metal layer are separate metal deposition steps and wherein the upper surfaces of said first plurality of patterned metal lines is above the upper surfaces of said second plurality of patterned metal lines.
A method for forming a dynamic memory array fabricated in a semiconductor device, said process comprising the steps of:
- forming a semiconductor substrate assembly having a plurality of dynamic memory cells;
- forming an insulative material having a substantially planar surface over said semiconductor substrate assembly;
- forming a first metal layer on said insulative material;
- forming a hard mask layer over said first metal layer;
- patterning and etching said hard mask layer and said first metal layer to form a patterned hard mask overlying a first plurality of patterned metal lines;
- forming insulative spacers about said patterned hard mask and said patterned metal lines;
- forming trenches into said insulative material along side said insulative spacers;
- forming a second metal layer that covers said patterned hard mask, said insulative spacers and at least partially fills said trenches;
- removing a portion of said second metal layer covering said hard mask to form a second plurality of patterned metal lines wherein each metal line of said second plurality of patterned metal lines is completely recessed within a corresponding trench;
- wherein said step of forming a first metal layer and said step of forming a second metal layer are separate metal deposition steps and wherein the upper surfaces of said first plurality of patterned metal lines is above the upper surfaces of said second plurality of patterned metal lines.
A method for forming a static memory array fabricated in a semiconductor device, said process comprising the steps of:
- forming a semiconductor substrate assembly having a plurality of static memory cells;
- forming an insulative material having a substantially planar surface over said semiconductor substrate assembly;
- forming a first metal layer on said insulative material;
- forming a hard mask layer over said first metal layer;
- patterning and etching said hard mask layer and said first metal layer to form a patterned hard mask overlying a first plurality of patterned metal lines, said etching resulting in sidewalls along edges of said;
- forming insulative spacers about said patterned hard mask and said patterned metal lines;
- forming trenches into said insulative material along side said insulative spacers;
- forming a second layer that covers said patterned hard mask, said insulative spacers and at least partially fills said trenches;
- removing a portion of said second layer covering said hard mask to form a second plurality of patterned metal lines wherein each metal line of said second plurality of patterned metal lines is completely recessed within a corresponding trench;
- wherein said step of forming a first metal layer and said step of forming a second metal layer are separate metal deposition steps and wherein the upper surfaces of said first plurality of patterned metal lines is above the upper surfaces of said second plurality of patterned metal lines.
Dependencies are inferred from the claim text.