Phase-shifting mask with multiple phase-shift regions

A phase-shifting mask comprising a transparent photomask plate, an opaque portion formed of an opaque film on said transparent photomask plate and transmitting portions formed of openings in said opaque film,

• wherein said transmitting portions include:
• plural first transmitting areas periodically arranged with said opaque portion disposed therebetween, said first transmitting areas being arranged along a first direction and a second direction different from said first direction;
• and
• at least one second transmitting area provided in a central portion of an area surrounded with four first transmitting areas which are adjacent to each other along said first and second directions among said plural first transmitting areas, said second transmitting area and each of said four first transmitting areas surrounding said second transmitting area being arranged with said opaque portion disposed therebetween,
• a phase difference of substantially 180 degrees in exposure light is caused between two first transmitting areas which are adjacent to each other along said first direction or said second direction among said plural first transmitting areas,
• a phase difference of substantially 90 degrees in said exposure light is caused between said second transmitting area and said four first transmitting areas surrounding said second transmitting area.