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US 6,280,885 B1Granted
Dust cover comprising anti-reflective coating
AssigneeDuPont Photomasks, Inc.
InventorJoseph S. Gordon
Life of this patent
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Abstract
A dust cover having a film with an inorganic, anti-reflective coating and method for use during semiconductor fabrication. The dust cover is primarily for use during photolithography. The dust cover may include an amorphous fluoropolymer film having an inorganic, anti-reflective coating attached to a frame. The inorganic, anti-reflective coating preferably has a refractive index below 1.4.
Claims8
A system for preventing dust from contacting a photomask, comprising:
- a frame coupled to the photomask;
- a film attached to the frame;
- the film comprising an amorphous fluoropolymer substrate with a first inorganic anti-reflective coating;
- and
- the first inorganic anti-reflective coating formed in a vacuum chamber including an increased pressure operable to lower the refractive index of the first inorganic anti-reflective coating to less than or equal to 1.2.
2 more elements
Dependencies are inferred from the claim text.