Electrostatic method and apparatus for vaporizing precursors and system for using same
AssigneeMicron Technology, Inc.
InventorsDavid R. Atwell, Brian A. Vaartstra
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AssigneeMicron Technology, Inc.
InventorsDavid R. Atwell, Brian A. Vaartstra
Estimating the term…
A vaporizing apparatus for providing a vaporized precursor for a vapor deposition process includes a dispensing device for providing precursor spray having a first electrical charge into a vaporization zone. The apparatus further includes a heated element in the vaporization zone having a second electrical charge opposite of the first charge. The heated element vaporizes the precursor spray attracted thereto. The dispensing device may be an electrostatic spray device for spraying a powdered precursor, a mixture of powdered precursors, one or more powdered precursors cut with an inert filler material, one or more liquid precursors adsorbed on solid particles, one or more gas precursors adsorbed on solid particles, a liquid precursor, a mixture of liquid precursors, or one or more solid precursors dissolved in one or more solvents. A method of vaporizing precursors for vapor deposition processes includes providing a precursor spray having a first electrical charge. At least a portion of the precursor spray is vaporized using a heated element having a second electrical charge opposite of the first electrical charge.
A vaporizing apparatus for providing a vaporized precursor for a vapor deposition process, the apparatus comprising:
A method of vaporizing precursors for vapor deposition processes, the method comprising the steps of:
A vapor deposition system comprising:
A method of vaporizing precursors for vapor deposition processes, the method comprising the steps of:
A method of vaporizing precursors for vapor deposition processes, the method comprising the steps of:
A method of controlling the vaporization of precursors for vapor deposition processes, the method comprising the steps of:
A vaporizing apparatus for providing a vaporized precursor to a process chamber in a vapor deposition process, the apparatus comprising:
Dependencies are inferred from the claim text.