Reactor for coating plane substrates and method for producing said substrates

Reactor for coating flat substrates, comprising:

• a reaction vessel into which reaction gases can be introduced;
• and
• a substrate holder unit in the form of a carrier ring in which at least one substrate to be coated is held in at least one holder such that a main surface of the at least one substrate to be coated is oriented downward during a deposition operation and is aligned essentially in parallel to a flow direction of the reaction gases;
• wherein
• at least one space for a substrate is provided on the substrate holder unit;
• the at least one holder is constructed as a template which has openings for surfaces of the at least one substrate to be coated;
• a surface of the at least one holder extends at least approximately flush with a surface of the at least one substrate;
• the at least one holder is adapted to be introduced into the reactor together with the at least one substrate and to be removed again from it;
• the at least one holder comprises at its bottom surface three fingers leading out in a common central axis which is also an axis of rotation for the at least one substrate;
• the at least one holder is adapted for introducing the at least one substrate into the reactor vessel from below, lateral to the flow direction of the reaction gases, through a lower opening of the reactor vessel;
• the axis is provided gas-tightly but rotatably through a lower quartz plate which has larger dimensions than the lower opening of the reactor vessel;
• and
• the quartz plate can be gas-tightly sealed to the lower opening of the reactor in the downward direction.