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US 6,274,287 B1Granted
Positive resist compositions comprising a hydroxyphenyl ketone
AssigneeSumitomo Chemical Company, Limited
InventorsHiroshi Moriuma, Yoshiyuki Takata
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Abstract
A positive resist composition excellent in resolution, having a good balance with other performances required to resists and comprising an alkali-soluble resin, a radiation-sensitive ingredient and a hydroxyphenyl ketone compound represented by the following formula (I): wherein R1, R2, R3, R4 and R5 independently represent hydrogen, alkyl or alkoxy and n represents an integer of 1 to 3 is provided.
Claims7
A positive resist composition comprising an alkali-soluble resin, a radiation-sensitive ingredient and a hydroxyphenyl ketone compound represented by the following formula (I):
- wherein R1, R2, R3, R4and R5independently represent hydrogen, alkyl or alkoxy and n represents an integer of 1 to 3.
Dependencies are inferred from the claim text.