Method to reduce the particles in load-lock chamber

A method for preventing corrosion and particulate in a load-lock chamber, from which a wafer in a cassette is transferred by a transferred module thereto an etching chamber, and then withdrawing said wafer to said cassette, said load-lock chamber comprising an outlet of a N2-purge tube therein, wherein said load-lock chamber encloses an environment having a first temperature, said method comprising:

• coupling heating means to said N2-purge tube;
• and
• heating N2 gases before injecting the N2 qases into said N2-purge tube so that said N2-purge tube has a second temperature being at least not lower than said first temperature of said environment in said load-lock chamber.

An apparatus for preventing corrosion and particulate in a load-lock chamber, wherein said load-lock chamber encloses an environment having a first temperature comprising:

• a N2-purge tube, set in said load-lock chamber, having an outlet;
• and
• heating means, coupling said N2-purge tube, for heating said N2-purge tube to a second temperature being at least not lower than said first temperature of said environment within said load-lock chamber.