Vaporizing device for CVD source materials and CVD apparatus employing the same

A vaporizing device for vaporizing chemical vapor deposition (CVD) source materials comprising:

• a vaporizer for vaporizing CVD source materials by heating, the vaporizer including a chamber having a heat conductive chamber wall with an inlet for introducing the CVD source materials into the chamber;
• a spray nozzle having a first end located to spray a CVD source material into the chamber through the inlet;
• a plate, having at least a portion thinner than the chamber wall, contacting and locating the spray nozzle relative to the inlet to spray CVD source materials into the chamber, the plate limiting thermal conduction from the chamber wall, thereby providing thermal insulation of the spray nozzle from the chamber wall;
• a cooling block in contact with and surrounding the spray nozzle for conducting heat from and cooling the spray nozzle;
• and
• a vacuum region between the cooling block and the chamber wall, thermally isolating the spray nozzle and the cooling block from the chamber wall.

A chemical vapor deposition (CVD) apparatus comprising:

• a vaporizer for vaporizing CVD source materials by heating, the vaporizer including a chamber having a heat conductive chamber wall with an inlet for introducing the CVD source materials into the chamber;
• a spray nozzle having a first end located to spray a CVD source material into the chamber through the inlet;
• a plate, having at least a portion thinner than the walls of the chamber, contacting and locating the spray nozzle relative to the inlet to spray CVD source materials into the chamber, the plate limiting thermal conduction from the chamber wall, thereby providing thermal insulation of the spray nozzle from the chamber wall;
• a cooling block in contact with and surrounding the spray nozzle for conducting heat from and cooling the spray nozzle;
• a vacuum region between the cooling block and the chamber wall, thermally isolating the spray nozzle and the cooling block from the chamber wall;
• and
• a reaction chamber receiving the CVD source materials vaporized by the vaporizing device for forming a film on a substrate through reaction of the CVD source materials.