Projection exposure apparatus and method

An exposure apparatus for projecting an image of a plate onto a substrate to be exposed through a projection optical system, said apparatus comprising:

• means for detecting locations of first and second marks on the plate relative to first and second reference marks fixed on a side plate of the projection optical system, without performing the detection through the projection optical system;
• means for determining deformation of the plate in accordance with the detection of the differences in positions of the marks on the plate and the reference marks in relation to a difference in positions of the reference marks of the projection optical system;
• and
• means for controlling a magnification of the projection optical system and a position of the plate relative to a position of the substrate to be exposed in accordance with the determined deformation.

An exposure apparatus for relatively scanning a plate and a substrate to be exposed, while projecting an image of the plate onto the substrate to be exposed through a projection optical system, said apparatus comprising:

• means for detecting locations of first and second marks on the plate relative to first and second reference marks fixed on a side plate of the projection optical system, without performing the detection through the projection optical system;
• means for determining deformation of the plate in accordance with the detection of the differences in positions of the marks on the plate and the positions of the reference marks in relation to the difference in positions of the reference marks of the projection optical system;
• and
• means for controlling a magnification of the projection optical system and a relative scanning direction of the plate and the substrate to be exposed in accordance with the determined deformation.

An exposing method for projecting an image of a plate onto a substrate to be exposed through a projection optical system, said method comprising the steps of:

• detecting locations of first and second marks on the plate relative to first and second reference marks fixed on a side plate of the projection optical system, without performing the detection through the projection optical system;
• determining an elongation of the plate in accordance with the detection of the differences in positions of the marks on the plate and the positions of the reference marks in relation to a difference in positions of the reference marks of the projection optical system;
• and
• controlling a magnification of the projection optical system in accordance with the determined elongation.

An exposing method for projecting an image of a plate onto a substrate to be exposed through a projection optical system, said method comprising the steps of:

• detecting locations of first and second marks on the plate relative to first and second reference marks fixed on a side plate of the projection optical system, without performing the detection through the projection optical system;
• determining deformation of the plate in accordance with the detection of the differences in positions of the marks on the plate and the reference marks in relation to a difference in positions of the reference marks of the projection optical system;
• and
• controlling a magnification of the projection optical system and a position of the plate relative to a position of the substrate to be exposed in accordance with the determined deformation.

An exposing method for relatively scanning a plate and a substrate to be exposed, while projecting an image of the plate onto the substrate to be exposed through a projection optical system, said method comprising the steps of:

• detecting locations of first and second marks on the plate relative to first and second reference marks fixed on a side plate of the projection optical system, without performing the detection through the projection optical system;
• determining deformation of the plate in accordance with the detection of the differences in positions of the marks on the plate and the reference marks in relation to a difference in positions of the reference marks of the projection optical system;
• and
• controlling a magnification of the projection optical system and a relative scanning direction of the plate and the substrate to be exposed in accordance with the determined deformation.