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US 6,270,949 B1Granted
Single component developer for copolymer resists
AssigneeInternational Business Machines Corporation
InventorsThomas B. Faure, Steven D. Flanders, James P. Levin, Harold G. Linde, Jeffrey F. Shepard
Life of this patent
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Abstract
A method for developing copolymer photosensitive resists wherein a single solvent is used in conjunction with a puddle develop tool. The copolymer resist is ZEP 7000 and the developer is ethyl 3-ethoxy propionate (EEP).
Claims6
The method of processing a copolymer photosensitive resist on the surface of a substrate including the steps of:
- exposing portions of said copolymer resist to an image pattern which renders exposed portions soluble in organic solvents;
- and
- developing said exposed portions of said resist by rotating said substrate and providing an atmosphere consisting substantially of a single component solvent having a boiling point in excess of 102 degrees Centigrade.
Dependencies are inferred from the claim text.