Method and apparatus for reducing non-uniformity area effects in the manufacture of semiconductor devices
AssigneesInfineon Technologies AG, International Business Machines Corporation
InventorsSteffen Schulze, Franz Zach
Life of this patent
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Abstract
The non-uniformity edge effect that can affect the quality of chips near the edge of a semiconductor wafer of various steps in the manufacture of integrated circuits is reduced. This is achieved by increasing the field area exposed by a step and repeat printer only when printing squares for chips located near the wafer edge. As a result there is also printed for processing an additional non-functional area outside the functional area to reduce the non-uniformity effect. This increases throughput of the printing apparatus.
Claims4
A method for the step and repeat printing of a pattern of squares on a semiconductive wafer of a circular area comprising the steps of:
- printing a pattern of squares of a first standard are a in regions of the wafer sufficiently remote from the periphery of the wafer to be essentially free of the edge effect. and
- printing a pattern of squares of an area larger than the standard area in regions of the wafer near the periphery of the wafer which are subject to the edge effect.
A method for obtaining from a wafer functional chips of a standard size in a process in which a circular wafer is printed with squares and in which the squares away from the periphery of the wafer that are essentially free of the edge effect, are printed to have a standard size and the squares printed at the periphery of the wafer that are subject to the edge effect, are printed to have a size larger than the standard size and then the wafer is diced uniformly to provide chips of the same size both from the squares printed of standard size and the squares printed of size larger than the standard size.
Dependencies are inferred from the claim text.