Photosensitive polymer having cyclic backbone and resist composition comprising the same

Abstract

A photosensitive polymer having a cyclic backbone and containing an alicyclic compound and a resist composition obtained therefrom are provided. The photosensitive polymer has a weight-average molecular weight of between about 3,000-100,000 and represented by the following formula: wherein R1, R2 and R5 are independently hydrogen or methyl, R3 is methyl, ethyl, C3 to C20 aliphatic hydrocarbon or alicyclic compound, R4 is hydrogen, hydroxy, hydroxymethyl, carboxylic acid, 2-hydroxyethyloxycarbonyl, tert-butoxycarbonyl or alicyclic compound, R6 is hydrogen atom, 2-hydroxyethyl, tert-butyl, isobornyl, adamantyl, norbornyl or menthyl, l/(l+m+n+p) is between about 0.1-0.5, m/(l+m+n+p) is between about 0.3-0.5, n/(l+m+n+p) is between about 0.0-0.3, and p/(l+m+n+p) is between about 0.0-0.3.

Dependencies are inferred from the claim text.