Individually controlled environments for pulsed addition and crystallization

Abstract

An apparatus for forming thin films includes a deposition chamber having a window and having an environment maintained at a temperature and pressure selected for optimized deposition conditions. A target is supported within the deposition chamber, and a laser source projects a laser beam through the window onto the target with sufficient energy and duration to produce an ablation plume. A crystallization chamber is in communication with the deposition chamber through an opening and has an environment maintained at a temperature and pressure selected for optimized crystallization conditions. A substrate is movably supported within the crystallization chamber in front of the opening in alignment with the ablation plume. A seal or other suitable means segregates the environments of the deposition chamber and the crystallization chamber.

Dependencies are inferred from the claim text.