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US 6,270,585 B1Granted
Device and process for treating substrates in a fluid container
AssigneeSteag MicroTech GmbH
InventorDietmar Schonleber
Life of this patent
Estimating the term…
Abstract
A method and apparatus for handling substrates in a fluid container are provided. Even large substrates receive a particularly reliable support by means of at least one support strip that can be placed upon the upper edge portion of the substrates, and in particular in such a way that the support strip does not come into contact with treatment fluid in the tank.
Claims7
A method of handling substrates in a fluid tank that contains a treatment fluid, said method including the steps of:
- placing said substrates, which are spaced from one another, as sets into said fluid tank;
- treating said substrates in said fluid tank after said placing step;
- during raising and/or lowering of said substrates out of or into said fluid tank, disposing a support strip upon an upper edge of said substrates, which upper edge extends out of said treatment fluid, such that said support strip does not come into contact with said treatment fluid;
- initiating raising of said substrates out of said fluid tank, wherein said step of disposing a support strip comprises disposing said support strip upon said upper edge of said substrates that has already been raised out of said treatment fluid;
- and
- continuing to raise said substrates, together with said support strip.
3 more elements
Dependencies are inferred from the claim text.