Wet-oxidation apparatus and wet-oxidation method

A wet-oxidation apparatus, comprising:

• a reaction tube capable of accommodating a seconds wafer or semiconductor wafers;
• a water vapor generating apparatus for generating water vapor;
• an inert gas supply unit for supplying an inert gas;
• a gas supply passage for supplying gas into said reaction tube;
• a gas switching unit capable of switching between the water vapor from said water vapor generating unit and the inert gas form said inert gas supply unit so as to supply either one of said water vapor and said inert gas to said gas supply passage;
• and
• a control unit capable of controlling said water vapor generating apparatus and said gas switching unit, wherein said control unit controls such that,
• at least while wet-oxidation processing of said semiconductor wafer or wafers is conducted predetermined times in said reaction tube, said water vapor generating apparatus continuously generates the water vapor,
• whenever said wet-oxidation processing is started one time, the water vapor from said water vapor generating apparatus is switched toward said gas supply passage,
• whenever said wet-oxidation processing is completed one time, the water vapor from said water vapor generating apparatus is switched to the inert gas from said inert gas supply unit so as to supply the inert gas to said gas supply passage.

A wet-oxidation apparatus, comprising:

• a reaction tube capable of accommodating a semiconductor wafer or semiconductor wafers;
• a water vapor generating apparatus for generating water vapor;
• a gas supply passage for supplying gas into said reaction tube;
• and
• a control unit controlling such that,
• at least while wet-oxidation processing of said semiconductor wafer or wafers is conducted predetermined times in said reaction tube, said water vapor generating apparatus continuously generates water vapor,
• whenever said wet-oxidation processing is started one time, the water vapor from said water vapor generating apparatus is supplied to said gas supply passage, and
• whenever said wet-oxidation processing is completed one time, a supply of the water vapor from said water vapor generating apparatus into said reaction tube is stopped.

A wet oxidation apparatus comprising:

• a reaction vessel capable of receiving one or more semiconductor wafers for wet oxidation thereof;
• a wafer transfer apparatus for selectively transferring wafers into or out of said reaction vessel;
• a water vapor generating apparatus for generating water vapor and for supplying said vapor to said reaction vessel;
• a gas supply passage for supplying gas into said reaction vessel;
• gas switching valuing for selectively supplying said water vapor from said water vapor generating apparatus and the gas from said gas supply passage to said reaction vessel, and for selectively venting said water vapor from said water vapor generating apparatus externally of said reaction vessel;
• and
• a control for controlling at least said gas switching valving and said wafer transfer apparatus, said control, after wet oxidation processing is performed on said one or more semiconductor wafers,
• controlling said gas switching valving to supply said gas from said gas supply passage and to vent said water vapor externally of said reaction vessel, and
• controlling said wafer transfer apparatus to transfer wafers into or out of said reaction vessel while water vapor generated by said water vapor generating apparatus is vented externally of said reaction vessel.