US 6,267,142 B1 · Fluid delivery stablization for wafer preparation systems

Abstract

A solution delivery system for use with a wafer preparation system is provided. The solution deliver system includes a de-ionized water (DIW) dispense drawer having an input for receiving an initial flow of DIW from a facility water supply. The DIW dispense drawer further includes a first pressure regulator for stabilizing the initial flow of DIW and producing a substantially steady flow of DIW as a DIW output of the DIW dispense drawer. A chemical drawer is also provided as part of the solution delivery system. The chemical drawer is configured to receive the substantially steady flow of DIW from the DIW dispense drawer. The chemical drawer is further configured to receive an initial flow of chemicals from a chemical source. The chemical drawer also includes a second pressure regulator for stabilizing the initial flow of chemicals from the chemical source and thus producing a substantially steady flow of chemicals. In this example, the chemical drawer further includes a mix manifold for mixing the substantially steady flow of DIW received from the DIW dispense drawer and the substantially steady flow of chemicals. The mix manifold being configured to output a chemical solution having a controlled concentration.

Claims20

Dependent claims

A solution delivery system for use with a wafer preparation system, comprising:

a de-ionized water (DIW) dispense drawer having an input for receiving an initial flow of DIW from a facility water supply, a first pressure regulator for stabilizing the initial flow of DIW and producing a substantially steady flow of DIW as a first DIW output of the DIW dispense drawer, and a high flow line configured for non-critical wafer preparation operations, the high flow line receiving as an input the initial flow of DIW from the facility water supply and producing a substantially unregulated flow of DIW as a second DIW output of the DIW dispense drawer;
and
a chemical drawer configured to receive the substantially steady flow of DIW and the substantially unregulated flow of DIW from the DIW dispense drawer, the chemical drawer further being configured to receive an initial flow of chemicals from a chemical source, and the chemical drawer further including a second pressure regulator for stabilizing the initial flow of chemicals from the chemical source and producing a substantially steady flow of chemicals, and a mix manifold for mixing the substantially steady flow of DIW received from the DIW dispense drawer and the substantially steady flow of chemicals, the mix manifold being configured to output a chemical solution having a controlled concentration.

A chemical delivery system for channeling fluids received from a water source and a chemical source to a chemical wafer preparation station, comprising:

a chemical module configured to receive a flow of DIW from the water source and to receive an initial flow of chemicals from the chemical source, the chemical module including a pressure regulator for stabilizing the initial flow of chemicals from the chemical source and producing a substantially steady flow of chemicals by reducing a pressure of the initial flow of chemicals, a valve for controlling communication of chemicals coupled to a line from the chemical source at a point before the pressure regulator, and a flow meter configured to deliver a controlled amount of chemicals coupled to the line from the chemical source at a point after the pressure regulator.

Dependencies are inferred from the claim text.

Fluid delivery stablization for wafer preparation systems

Life of this patent

Fluid delivery stablization for wafer preparation systems

Life of this patent

Abstract

Claims20