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US 6,267,074 B1Granted
Plasma treatment systems
AssigneeFOI Corporation
InventorYutaka Okumura
Life of this patent
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AssigneeFOI Corporation
InventorYutaka Okumura
Estimating the term…
A plasma treatment system comprises a plasma treatment section in which a plasma treatment space is formed and a plasma producing section in which plasma producing spaces are formed, the plasma producing section being affixed to or formed as a single piece with the plasma treatment section, wherein the plasma producing spaces are located adjacent to and connected to the plasma treatment space and are formed in a dispersed or otherwise distributed fashion. The system is associated with a magnetic circuit for confining electrons within the plasma producing spaces. The system has good controllability over the ratio of plasma constituents. Furthermore, the plasma treatment space is surrounded by a movable wall member to also enhance pressure controllability.
A plasma treatment system in which a plasma treatment space is formed between a pair of parallel plates which serve as facing electrodes, wherein plasma producing spaces which are located adjacent to and connected to said plasma treatment space are formed in a dispersed or otherwise distributed fashion in one of said pair of parallel plates or in its adjoining mechanism section, and further wherein the sectional area of a region connected to or opening to said plasma treatment space is smaller than the sectional area of said plasma producing spaces.
A plasma treatment system in which a plasma treatment space is formed between a pair of parallel plates which serve facing electrodes, wherein plasma producing spaces which are located adjacent to and connected to said plasma treatment space are formed in a dispersed or distributed fashion in one of said pair of parallel plates or in its adjoining mechanism section, and said plasma producing spaces are associated with a magnetic circuit, magnetic elements for creating the magnetic circuit being disposed in a region surrounded or sandwiched by said plasma producing spaces, wherein the sectional area of a region connected to or opening to said plasma treatment space is smaller than the sectional area of said plasma producing spaces.
A plasma treatment system in which a plasma treatment space is formed between a pair of parallel plates which serve as facing electrodes, wherein plasma producing spaces which are located adjacent to and connected to said plasma treatment space are formed in a dispersed or otherwise distributed fashion in one of said pair of parallel plates or in its adjoining mechanism section, and said plasma producing spaces are associated with a magnetic circuit for confining electrons, and further wherein the sectional area of a region connected to or opening to said plasma treatment space is smaller than the sectional area of said plasma producing spaces.
A plasma treatment system in which a plasma treatment space is formed between a pair of parallel plates which serve as facing electrodes, wherein plasma producing spaces which are located adjacent to and connected to said plasma treatment space are formed in a dispersed or distributed fashion in one of said pair of parallel plates or in its adjoining mechanism section, further comprising:
A plasma treatment system in which a plasma treatment space is formed between a pair of parallel plates which serve as facing electrodes, wherein plasma producing spaces which are located adjacent to and connected to said plasma treatment space formed in a dispersed or distributed fashion in one of said pair of parallel plates or in its adjoining mechanism section, and said plasma producing spaces are associated with a magnetic circuit, magnetic elements for creating the magnetic circuit being disposed in a region surrounded or sandwiched by said plasma producing spaces, further comprising:
A plasma treatment system in which a plasma treatment space is formed between a pair of parallel plates which serve as facing electrodes, wherein plasma producing spaces which are located adjacent to and connected to said plasma treatment space are formed in a dispersed or distributed fashion in one of said pair of parallel plates or in its adjoining mechanism section, and said plasma producing spaces are associated with a magnetic circuit for confining electrons, further comprising:
A plasma treatment system, comprising:
Dependencies are inferred from the claim text.