Technique and process for the imaging and formation of various devices and surfaces

Abstract

A technique is described for the formation of nano and micro-scale patterns and optical wave-guides, by using Bipolar Electrochemistry. Atoms are deposited or removed from a surface by creating and moving ions into or out of a medium by the use of electric fields, currents, and induced surface charges. To improve the deposition process, lasers, electron, and ion lenses can be positioned over the surface being deposited to further define the pattern being created. This technique does not harm the surface or crystal lattice of the substrate being deposited on and is powerful enough to transport dopants completely through a substrate. The technique can be used to expose electron beam activated resist which can be used in traditional fabrication processes or to create wave-guides connecting separate optical or electro-optical devices together. As a result smaller and newer types of integrated circuits, electronic devices, and micro machines can be fabricated. The technique can also be used to improve current fabrication processes, the repair of faulty devices, and the imaging of surfaces and hidden dopants.

Dependencies are inferred from the claim text.