Method and device for coating a metal strip

The method according to 5, wherein CK is set to at least one.

A coating plant for coating a metal strip using a coating metal, comprising:

• an electroplating cell through which current flows, the electroplating cell including an electrolyte through which the metal strip is passed, the current effecting a deposition of a layer of the coating metal on the metal strip;
• and
• a computing device controlling the current using a monitor controller, the monitor controller including a process model and a controller part, the computing device controlling the current in such a way that the layer deposited on the metal strip has a predetermined thickness, the computing device controlling the current as a function of a coating weight mean value using a dynamic low-pass filter, the computing device being adapted to adjust a time constant of the controller part if a state of the coating plant is altered, the time constant being adjusted to the altered state, wherein the state of the coating plant is altered when a new metal strip enters the coating plant or the layer deposited on the metal strip is less than a predetermined minimum thickness.

A coating plant for coating a metal strip using a coating metal, comprising:

• an electroplating cell through which current flows, the electroplating cell including an electrolyte through which the metal strip is passed, the current effecting a deposition of a layer of the coating metal on the metal strip;
• and
• a computing device controlling the current using a monitor controller, the monitor controller including a process model and a controller part, the computing device controlling the current in such a way that the layer deposited on the metal strip has a predetermined thickness, the computing device controlling the current as a function of a coating weight minimum value using a dynamic low-pass filter, the computing device being adapted to adjust a time constant of the controller part if a state of the coating plant is altered, the time constant being adjusted to the altered state, wherein the state of the coating plant is altered when a new metal strip enters the coating plant or the layer deposited on the metal strip is less than a predetermined minimum thickness.

A coating plant for coating a metal strip using a coating metal, comprising:

• an electroplating cell through which current flows, the electroplating cell including an electrolyte through which the metal strip is passed, the current effecting a deposition of a layer of the coating metal on the metal strip;
• and
• a computing device controlling the current using a monitor controller, the monitor controller including a process model and a controller part, the computing device controlling the current in such a way that the layer deposited on the metal strip has a predetermined thickness, the computing device being adapted to adjust a time constant of the controller part if a state of the coating plant is altered, the time constant being adjusted to the altered state, wherein the state of the coating plant is altered a new metal strip enters the coating plant or the layer deposited on the metal strip is less than a predetermined minimum thickness, occurs, and wherein the computing device is configured to determine a value of the current as a function of a coating weight setpoint, a strip width, a strip speed, a deposition equivalent value, and one of i) an efficiency of the electroplating cell, or ii) an efficiency of the controller output.