X-ray mask provided with an alignment mark and method of manufacturing the same
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorsKoji Kise, Hideki Yabe, Sunao Aya, Kaeko Kitamura, Kenji Marumoto, Shigeto Ami
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Abstract
An X-ray mask which is provided with an alignment mark and a transfer circuit pattern having a high position accuracy can be manufactured through a simplified manufacturing process. A membrane allowing passage of X-rays is formed on a substrate. A X-ray absorber intercepting transmission of X-rays is formed on the membrane. The substrate includes a window exposing the membrane. The X-ray absorber includes a transfer circuit pattern and an alignment mark formed in a region not overlapping with the window in a plan view.
Claims11
An X-ray mask comprising:
- a substrate;
- a membrane formed on said substrate and allowing passage of X-rays;
- and
- an X-ray absorber formed on said membrane and intercepting transmission of X-rays, wherein
- said substrate includes a window exposing said membrane, and
- said X-ray absorber includes:
- a transfer circuit pattern, and
- an alignment mark formed in a region not overlapping with said window in a plan view.
A method of manufacturing an X-ray mask, comprising the steps of:
- forming a membrane allowing passage of X-rays on a substrate;
- forming an X-ray absorber intercepting transmission of X-rays on said membrane;
- forming a window exposing said membrane in said substrate;
- forming a first mask layer on said X-ray absorber;
- writing a first mask pattern on said first mask layer;
- effecting development on said first mask layer to form a first mask pattern layer;
- removing said X-ray absorber using said first mask pattern layer as a mask, and thereby forming an opening functioning as an alignment mark in a region not overlapping with said opening in a plan view.
Dependencies are inferred from the claim text.