Process and apparatus for photomechanical production of structured surfaces, especially for irradiation of offset press plates
AssigneeFriedrich Luellau
InventorsFriedrich Lüllau, Claus Mayer, Rolf Lüllau
Life of this patent
Estimating the term…
Loading patent…
AssigneeFriedrich Luellau
InventorsFriedrich Lüllau, Claus Mayer, Rolf Lüllau
Estimating the term…
The invention relates to a process for the photomechanical production of structured surfaces on a pattern support as an image for an electronically stored original, in particular for exposing offset print plates. The invention further relates to a device for carrying out the process. The original is broken down electronically into partial images which are displayed successively on a liquid crystal screen and reproduced on the pattern support such that the images recombine to form a total image of the original on the design support. The information in a partial image is checked and the partial image is reproduced on the pattern support according to this check.
A process for photomechanical production of structured surfaces on a pattern carrier as a copy of an electronically stored model, for irradiation of offset press plates, in that the model is broken apart electronically into fragmentary images, and the fragmentary images are represented in succession on a liquid crystal screen and copied on the pattern carrier in such a way that the copies combine again on the pattern carrier to form a total copy of the model, characterized in that each fragmentary image is assigned a first data set for its image content and a second data set for its position, and by means of an image information evaluation circuit or software the image content of each fragmentary image is investigated for whether picture information is contained in it, and as a function of this investigating copying of the fragmentary image onto the pattern carrier is effected, whereby the quantity of the second data sets is sorted such that the smallest possible sum of individual spacings between the positions of the fragmentary images results, and the data sets are transferred in this order to a numerical controller.
An apparatus for photomechanical production of structured surfaces, for irradiating offset press plates, having a light source, a digitally stored model, and a pattern carrier, being of an offset press plate, in which the model can be displayed on a liquid crystal screen and is copied onto the pattern carrier (1) by means of an optical component (8) provided in the beam path between the liquid crystal screen and the pattern carrier, wherein the copy and the pattern carrier are embodied as movable relative to one another in at least one axis, characterized in that a measuring and closed-loop control device (28) is provided for measuring and controlling the spacing of the liquid crystal screen or an irradiation head from the pattern carrier (1);
Dependencies are inferred from the claim text.