Double-sided exposure system
AssigneeHowa Machinery, Ltd.
InventorAtsushi Okamoto
Life of this patent
Estimating the term…
Abstract
A double-sided exposure system (1) has a first work holding device (21L) for holding a substrate (P) opposite to an exposure mask (55) to expose a first surface of the substrate (P) through the exposure mask (55) to light, and a second work holding device (21R) for holding the substrate (P) opposite to another exposure mask (55) to exposure a second surface of the substrate (P) through the exposure mask (55) to light. Phases of operations for receiving, transferring and pretreating an unexposed substrate, and those of operations for transferring, exposing and pretreating the substrate having one surface processed by an exposure operation can be staggered to prevent time loss due to waiting during an exposure operation can be prevented even if the double-sided exposure system is provided with a single light source.
Claims8
A double-sided exposure system for exposing a pair of opposite side surfaces of a plate to light through a pair of exposure masks respectively provided with necessary exposure patterns, said double-sided exposure system comprising:
- a first mask holding mechanism holding a first exposure mask to be used in exposing a first surface of the plate to light;
- a first work holding device holding said plate and capable of moving between a first exposure position in front of the first mask holding mechanism and a first home position where an exposed plate is mounted thereon;
- a second mask holding mechanism holding a second exposure mask to be used in exposing a second surface of the plate to light;
- a second work holding device holding said plate and capable of moving between a second exposure position in front of the second mask holding mechanism and a second home position where the two-sided exposed plate is removed therefrom;
- a single light source;
- an optical system for selectively transmitting light from said light source to a first optical path leading to the first exposure position or a second optical path leading to the second exposure position;
- and
- a work transfer mechanism capable of receiving the plate whose first surface has been exposed to light at the first exposure position from the first work holding device and transferring the plate to the second work holding device so that the second surface of the plate can be exposed to light.
Dependencies are inferred from the claim text.