Interconnection lines for improving thermal conductivity in integrated circuits and method for fabricating the same
AssigneeWorldwide Semiconductor Manufacturing Corp.
InventorChine-Gie Lou
Life of this patent
Estimating the term…
Abstract
The present invention discloses a structure of metal interconnection lines in integrated circuits for improving thermal conductivity therein. In the structure, a silicon nitride layer is formed underneath a first metal pattern of integrated circuits. Moreover, a silicon nitride plug is formed between two adjacent metal patterns and it serves as a thermal conductor. At least one metal plug in dielectric layers between the metal patterns is an electrical connection of integrated circuits. The present invention also discloses a method for fabricating the structure as mentioned above.
Claims10
A structure of metal interconnection lines in integrated circuits for improving thermal conductivity of said metal interconnection lines, comprising:
- a substrate, wherein said integrated circuits formed on said substrate;
- an interlayer dielectric layer formed on said substrate;
- a silicon nitride layer formed on said interlayer dielectric layer;
- at least one first metal plug formed in said interlayer dielectric layer and said silicon nitride layer;
- a first metal pattern formed on said silicon nitride layer and communicated with said integrated circuits by said at least one first metal plug;
- a liner oxide layer formed on said first metal pattern and on said silicon nitride layer;
- an intermetal dielectric layer formed on said liner oxide layer;
- at least one second metal plug formed in said intermetal dielectric layer and said liner oxide layer;
- at least one silicon nitride plug formed in said intermetal dielectric layer and said liner oxide layer;
- and
- a second metal pattern formed on said intermetal dielectric layer, said at least one silicon nitride plug and said at least one second metal plug, said second metal pattern communicated with said first metal pattern by said at least one second metal plug, wherein said at least one silicon nitride plug being adapted for improving thermal conductivity.
A structure of metal interconnection lines in integrated circuits for improving thermal conductivity of said metal interconnection lines, comprising:
- a substrate, wherein said integrated circuits formed on said substrate;
- a plurality of metal patterns formed on said substrate for interconnection lines of said integrated circuits, wherein said metal patterns isolated from each other and from said substrate by dielectric layers for insulating;
- at least one metal plug formed in one of said dielectric layers between one of said metal patterns and other of said metal patterns formed thereon, wherein said plurality of metal patterns communicating to each other and to said integrated circuits on said substrate by said at least one metal plug therebetween;
- and
- at least one silicon nitride plug formed between one of said metal patterns and other of said metal patterns formed thereon, wherein said at least one silicon nitride plug adapted for improving thermal conductivity of said plurality of metal patterns.
Dependencies are inferred from the claim text.