Homojunction semiconductor devices with low barrier tunnel oxide contacts
AssigneeMicron Technology, Inc.
InventorsLeonard Forbes, Kie Y. Ahn
Life of this patent
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Abstract
A homojunction bipolar transistor with performance characteristics similar to more costly heterojunction or retrograde base transistors. The high emitter resistivity found in prior homojunction devices is circumvented using a low work function material layer in forming the emitter. This produces an economically viable high performance alternative to SiGe HBTs or SiGe retrograde base transistors.
Claims18
A semiconductor device, comprising:
- an isolating substrate;
- a collector layer of a first conduction type and of a semiconductor material on the isolating substrate;
- a base layer of the semiconductor material on the collector layer, the base layer of a second conduction type;
- an emitter layer of the semiconductor material on the base layer, the emitter layer of the first conduction type;
- an oxide layer of the semiconductor material on the emitter layer;
- and
- a low work function material layer on the oxide layer.
A semiconductor chip, comprising:
- a plurality of semiconductor devices wherein at least one semiconductor device comprising:
- an isolating substrate;
- a collector layer of a first conduction type and of a semiconductor material on the isolating substrate;
- a base layer of the semiconductor material on the collector layer, the base layer of a second conduction type;
- an emitter layer of the semiconductor material on the base layer, the emitter layer of the first conduction type;
- an oxide layer of the semiconductor material on the emitter layer;
- and
- a low work function material layer on the oxide layer.
A computer system, comprising:
- a memory device;
- and
- a central processing unit comprising:
- a plurality of semiconductor devices wherein at least one semiconductor device comprising:
- an isolating substrate;
- a collector layer of a first conduction type and of a semiconductor material on the isolating substrate;
- a base layer of the semiconductor material on the collector layer, the base layer of a second conduction type;
- an emitter layer of the semiconductor material on the base layer, the emitter layer of the first conduction type;
- an oxide layer of the semiconductor material on the emitter layer;
- and
- a low work function material layer on the oxide layer.
A computer system, comprising:
- a central processing unit;
- and
- a memory device comprising:
- a plurality of semiconductor devices wherein at least one semiconductor device comprising:
- an isolating substrate;
- a collector layer of a first conduction type and of a semiconductor material on the isolating substrate;
- a base layer of the semiconductor material on the collector layer, the base layer of a second conduction type;
- an emitter layer of the semiconductor material on the base layer, the emitter layer of the first conduction type;
- an oxide layer of the semiconductor material on the emitter layer;
- and
- a low work function material layer on the oxide layer.
A semiconductor contact, comprising:
- a layer of semiconductor material;
- an oxide layer of the semiconductor material on the semiconductor material;
- and
- a low work function material layer on the oxide layer.
A homojunction bipolar transistor emitter comprising:
- a silicon layer;
- a silicon oxide layer on the silicon layer;
- and
- a low work function material layer on the silicon oxide layer.
A semiconductor device, comprising:
- a collector layer of a first conduction type and of a semiconductor material;
- a base layer of the semiconductor material on the collector layer, the base layer of a second conduction type;
- an emitter layer of the semiconductor material on the base layer, the emitter layer of the first conduction type;
- an oxide layer on the emitter layer;
- and
- a low work function material layer on the oxide layer.
Dependencies are inferred from the claim text.