Ion beam implantation using conical magnetic scanning
AssigneeAxcelis Technologies, Inc.
InventorVictor M. Benveniste
Life of this patent
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Abstract
Method and apparatus for use in treating a workpiece implantation surface by causing ions to impact the workpiece implantation surface. Ions emitted by an ion source are accelerated away from the ion source to form an ion beam. A magnetic field is created for intercepting the ions in the ion beam exiting the source and selectively deflectiing the ions away from an initial trajectory in a generally arcuate scanning motion. The magnetic field is created by synchronized energization of first and second current carrying coils located along an inner surface of a ferromagnetic support. The beam is deflected away from the initial trajectory by a controlled amount in a time varying manner to cause the beam to sweep through an arcuate path and impact the workpiece.
Claims12
An ion implanter having an ion source for emitting ions and an implantation chamber mounted in spaced relation to the ion source;
- apparatus defining an ion beam path from the ion source to the implantation chamber comprising:
- a) beam scanning structure positioned along the ion beam path between the ion source and the implantation chamber for deflecting ions by a deflection amount at a controlled scan angle with respect to an entrance trajectory followed by the ion beam as the beam enters the beam scanning structure, said beam scanning structure comprising:
- i) a support constructed from a ferromagnetic material mounted in relation to and extending along a portion of the beam path;
- and
- ii) one or more current carrying coils carried by the support for creating a deflecting magnetic field transverse to a direction of current through the current carrying coils, such that said magnetic field intercepts the ion beam in a deflection region bounded by the support;
- and
- b) a controller electrically coupled to the one or more current carrying coils that controllably energizes the current carrying coils to create a magnetic field that scans the beam in an arcuate path while maintaining the controlled scan angle to intercept different portions of a workpiece treatment zone.
Apparatus comprising:
- a) an ion source for emitting ions along a controlled initial trajectory for ion treatment of a workpiece;
- b) structure defining an implantation chamber mounted in spaced relation to the ion source and including a workpiece support for positioning the workpiece for treatment by ions exiting the ion source;
- c) beam scanning structure positioned along an ion beam path between the ion source and the implantation chamber for deflecting ions by a deflection amount with respect to an entrance trajectory followed by the ion beam as the beam enters the beam scanning structure, said beam scanning structure comprising:
- i) a support constructed from a ferromagnetic material mounted in relation to and extending along a portion of the beam path;
- and
- ii) one or more current carrying coils carried by the support for creating a deflecting magnetic field that intercepts the ion beam in a deflection region bounded by the support;
- and
- d) a controller electrically coupled to the one or more current carrying coils that controllably energizes the current carrying coils to create a magnetic field that scans the beam in an arcuate path while maintaining a controlled scan angle but in different directions to intercept different portions of a workpiece treatment zone.
A method of ion beam treatment of a workpiece comprising the steps of:
- a) emitting ions from an ion source and accelerating the ions away from the ion source to form an ion beam;
- and
- b) setting up a magnetic field for intercepting the ions in the ion beam exiting the source to selectively deflect the ions making up the beam away from an initial trajectory in an arcuate scanning motion by the steps of
- i) placing first and second current carrying coils along an inner surface of a support;
- and
- ii) selectively energizing both the first and the second current carrying coils in a coordinated manner to deflect the beam away from the initial trajectory by a controlled amount in a time varying manner to cause the beam to sweep through an arcuate path while maintaining a controlled scan angle.
An ion beam implant system for controllably treating a workpiece comprising:
- a) source means for providing ions to treat the workpiece;
- b) workpiece support means for orienting the workpiece at a target plane relative the source means;
- c) beam forming means for causing ions emitted by the source means to form an ion beam moving in a first trajectory;
- d) an electromagnet for deflecting ions in said ion beam away from said first trajectory by a controlled deflection angle that does not change as the workpiece is treated;
- e) control means coupled to the electromagnet for applying control voltages to energize the electromagnet to cause the ion beam to scan in an arcuate path while maintaining the controlled angular deflection with respect to the first trajectory;
- f) a downstream beam deflector for redeflecting the ion beam deflected by the electromagnet to the target plane;
- and
- g) scan means for translating the workpiece support means and thereby cause the ion beam to strike the workpiece at controlled regions on the workpiece surface.
Dependencies are inferred from the claim text.