Sputtering device for coating an essentially flat disk-shaped substrate

A cathodic sputtering device for coating an essentially flat, disk-like substrate with the aid of cathodic sputtering, comprising:

• an essentially cylindrical transport chamber, said transport chamber including a round disk-shaped lid, a bottom plate extending in a plane parallel to said lid, and an annular housing part connecting said lid and said bottom plate in a pressure-tight manner in spaced apart relationship, said annular housing forming a side wall of the transport chamber;
• a transfer opening for inserting and removing a substrate;
• a rotatable substrate carrier located within said transport chamber said rotatable substrate carrier separated from said transport chamber by a transport space, wherein said rotatable substrate carrier is rotated within said transport space;
• a motor-gear assembly, comprising an output shaft connected to said rotatable substrate carrier to rotate the rotatable substrate carrier within the transport space and to vertically displace the rotatable substrate carrier inside the transport space from a center operating position to an upper coating position and a lower rest position, said center operating position located intermediate to said upper coating position and said lower rest position;
• a coating chamber connected to the transport space through an opening in said lid, said coating chamber containing a cathode;
• and
• a vacuum pump connected to the transport chamber, wherein said vacuum pump has a suction connector connected to a bottom portion of said transport space such that said suction connector is sealed off by said rotatable substrate carrier when said rotatable substrate carrier is in the lower rest position.