Cleaning method
AssigneeTokyo Electron Limited
InventorsNaoki Shindo, Shigenori Kitahara, Hironobu Hyakutake
Life of this patent
Estimating the term…
Abstract
A cleaning method for cleaning, an object to be, processed. The object is cleaned by immersing the object into a cleaning liquid within a processing tank. The cleaning method includes the steps of: detecting the temperature of the cleaning liquid in which the object to be processed is immersed or to be immersed, and generating a corresponding temperature signal; determining an immersion time for the immersion of the object in the cleaning liquid, based on the temperature signal; and immersing the object to be processed in the cleaning liquid, for the immersion time.
Claims13
A cleaning method for cleaning an object to be processed, by immersing the object into a cleaning liquid within a processing tank, said cleaning method comprising the steps of:
- detecting a temperature of said cleaning liquid in which said object is immersed or to be immersed, and generating a corresponding temperature signal;
- determining in immersion time for the immersion of said object in said cleaning liquid, based on said temperature signal;
- rectifying said immersion time to be shorter than a reference immersion time if the detected temperature of said cleaning liquid is higher than a reference temperature;
- rectifying said immersion time to be longer than a reference immersion time if the detected temperature of said cleaning liquid is lower than the reference temperature;
- and
- immersing said object in said cleaning liquid, for said rectified immersion time.
A cleaning method for cleaning an object to be processed, by immersing the object into a cleaning liquid within a processing tank, said cleaning method comprising a chemical supply timeband during which a chemical is supplied into said processing tank to gradually increase a concentration of said chemical in said cleaning liquid and an immediately subsequent stabilized concentration timeband;
- wherein said cleaning method comprises the steps of:
- detecting a temperature of said cleaning liquid in which said object is immersed or to be immersed, and generating a corresponding temperature signal;
- rectifying a length of said chemical supply timeband, based on said temperature signal;
- and
- immersing said object in said cleaning liquid, for an immersion time that comprises said rectified chemical supply timeband length.
A cleaning method for cleaning an object to be processed, by immersing the object into a cleaning liquid within a processing tank, said cleaning method comprising a chemical supply timeband during which a chemical is supplied into said processing tank to gradually increase a concentration of said chemical in said cleaning liquid and an immediately subsequent stabilized concentration timeband;
- wherein said cleaning method comprises the steps of:
- detecting a temperature of said cleaning liquid in which said object is immersed or to be immersed, and generating a corresponding temperature signal;
- rectifying a length of said stabilized concentration timeband, based on said temperature signal;
- and
- immersing said object in said cleaning liquid, for an immersion time that comprises said rectified stabilized concentration timeband length.
A cleaning method for cleaning an object to be processed, by immersing the object into a cleaning liquid within a processing tank, said cleaning method comprising a chemical supply timeband during which a chemical is supplied into said processing tank to gradually increase a concentration of said chemical in said cleaning liquid and an immediately subsequent stabilized concentration timeband;
- wherein said cleaning method comprises the steps of:
- detecting a temperature of said cleaning liquid in which said object is immersed or to be immersed, and generating a corresponding temperature signal;
- pre-determining a rectification time in accordance with a concentration ratio of a processing liquid, for each of a temperature that is greater than a reference temperature for said processing liquid and a temperature that is less than said reference temperature;
- rectifying a length of said chemical supply time band by subtracting said rectification time from a reference time for a temperature given by said temperature signal that is greater than said reference time, or adding said rectification time to said reference time for a temperature given by said temperature signal that is less than said reference temperature;
- pre-determining a rectification coefficient in accordance with the concentration ratio of said processing liquid, for each temperature of said processing liquid;
- rectifying the length of said stabilized concentration timeband by multiplying a reference time for said stabilized concentration timeband by a rectification coefficient corresponding to the temperature given by said temperature signal;
- and
- immersing said object in said cleaning liquid, for an immersion time that comprises said rectified chemical supply timeband length and said rectified stabilized concentration timeband length.
A cleaning method for cleaning an object to be processed, by immersing the object into a cleaning liquid within a processing tank, said cleaning method comprising the steps of:
- detecting a temperature of said cleaning liquid in which said object is immersed or to be immersed, and generating a corresponding temperature signal;
- pre-determining rectification coefficients in accordance with a concentration ratio of a processing liquid, for each temperature of said processing liquid;
- determining a value of a rectification coefficient, based on said temperature signal;
- rectifying an immersion time of said object in the processing liquid, by multiplying a reference time for immersion with said rectification coefficient value;
- and
- immersing said object hi said cleaning liquid, for said rectified immersion time.
Dependencies are inferred from the claim text.