Aerosol assisted chemical cleaning method
AssigneeBall Semiconductor, Inc.
InventorChang Feng Xia
Life of this patent
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Abstract
An aerosol assisted chemical cleaning method to remove wall deposition from reaction chambers is provided. The method generates cleaning chemicals in an aerosol state, and then feeds them into the reaction chamber by a carrier gas. The cleaning chemicals interact quickly with unwanted deposits on all internal surfaces of the reaction chamber. By controlling the pressure in the closed reaction chamber, the deposits can be stripped off from the wall and fall into a waste acid collector. The acid collector can then process the waste to prevent contamination.
Claims7
A method for cleaning a chemical reaction chamber that attracts wall deposition during a semiconductor processing procedure, the method comprising the steps of:
- providing a chemical reaction chamber used for semiconductor processing, the chemical reaction chamber having an input and output means and wherein chemical deposits are present on walls of the chemical reaction chamber;
- providing an acidic cleaning chemical selected from the a group consisting of HF, HCl and H3PO4;
- transforming said acidic cleaning chemical into an aerosol state;
- feeding the aerosol of said acidic cleaning chemical into the chemical reaction chamber by a carrier gas through said input means of the chemical reaction chamber;
- and
- causing a reaction between said aerosol of said acidic cleaning chemical and the chemical deposits present on said walls, such that said chemical deposits are stripped off of said walls of the chemical reaction chamber.
Dependencies are inferred from the claim text.