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US 6,203,619 B1Granted
Multiple station apparatus for liquid source fabrication of thin films
AssigneeSymetrix Corporation
InventorLarry D. McMillan
Life of this patent
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Abstract
An apparatus and method are disclosed for fabricating thin films for use in an active component of an integrated circuit by the use of an assembly line type process. A plurality of substrate stations are located on a platen which is rotated to move each station sequentially between a misted deposition device, a drying device, and a solidification device. The misted deposition device includes a mist showerhead in a movable housing. The mist showerhead separates a velocity reduction chamber from a deposition chamber.
Claims20
An apparatus for fabricating a thin film, said apparatus comprising
- a. a predetermined sequence of devices, said predetermined sequence including:
- a misted deposition device including a mist showerhead, a velocity reduction chamber and a deposition chamber, said mist showerhead separating said velocity reduction chamber from said deposition chamber;
- a drying device;
- and a heating device;
- b) a movable platen;
- and
- c) a plurality of substrate stations located on said movable platen;
- d) said movable platen oriented with respect to said predetermined sequence of said devices and said plurality of stations arranged on said movable platen so that each one of said plurality of stations simultaneously comes into the operational vicinity of a different one of said devices.
5 more elements
Dependencies are inferred from the claim text.