Substrate processing apparatus and substrate processing method
AssigneeTokyo Electron Limited
InventorsTsutae Omori, Mitsuhiro Sakai, Shinobu Tanaka
Life of this patent
Estimating the term…
Abstract
When an edge processing head is scanned in one direction, the discharge of a rinse solution from a rinse solution discharge nozzle at the front in a carrying direction is stopped, a developing solution is discharged from a developing solution discharge nozzle, and a rinse solution is discharged from a rinse solution discharge nozzle at the rear in the carrying direction. Specifically, with a developing solution being discharged to a glass substrate, the discharge of a rinse solution immediately follows the discharge of the developing solution. Thus, the edge processing of the substrate can be performed with minimal increases in the number of processes and in installation.
Claims20
A substrate processing apparatus, comprising:
- a holding member for holding in a substrate;
- a first nozzle having a plurality of discharge ports, each facing an edge portion of the substrate, for discharging a developing solution to the edge portion of the substrate held by said holding member without discharging the developing solution to a central portion of the substrate;
- a second nozzle disposed adjacent to said first nozzle and having a discharge port facing the edge portion of the substrate, for discharging a rinse solution to the edge portion of the substrate held by said holding member without discharging the rinse solution to the central portion of the substrate;
- and
- a carrier that carries said second nozzle and said first nozzle in the direction of one side of the substrate held by said holding member.
A substrate processing apparatus, comprising:
- a substrate holder that holds a substrate;
- an edge processing head having a first nozzle that discharges a developing solution to an edge portion of the substrate held by said substrate holder, and
- a second nozzle arranged adjacent to the first nozzle that discharges a rinse solution to the edge portion of the substrate held by said substrate holder;
- a carrier that carries said edge processing head in a direction of one side of the substrate held by said substrate holder;
- and
- a controller that controls discharge of a developing a solution from the first nozzle and that controls discharge of a rinse solution from the second nozzle disposed at the rear in a scanning direction when said edge processing head is moved by said carrier.
A substrate processing method, comprising the steps of:
- discharging a developing solution to an edge portion of a held substrate from each of a plurality of discharge ports facing the edge portion of the substrate, without discharging the developing solution to a central portion of the substrate;
- and
- discharging a rinse solution to the edge portion of the held substrate from each of a plurality of discharge ports facing the edge portion of the substrate, without discharging the rinse solution to the central portion of the substrate.
Dependencies are inferred from the claim text.