Monitoring system for semiconductor device fabrication facility

Abstract

There is provided a monitoring system for monitoring semiconductor device fabrication facilities by allocating a specific frequency on each of the semiconductor device fabrication facilities, and connecting between each of the facilities and a central monitoring apparatus with information transmission line and selective signal line thereby simplifying the monitoring lines. The monitoring system comprises: a central monitoring apparatus outputting a signal having a specific frequency for selecting an object to be monitored via a selective signal line, and receiving the information transferred via an information transmission line from the object responsive to the specific frequency signal; and a plurality of semiconductor device fabrication facilities each of which is connected to the selective signal line and the information transmission line in parallel with a specific frequency for response allocated for each of them, and outputs a specific information received from its corresponding process via the information transmission line if it is selected by the select signal transmitted via the selective signal line to have its corresponding frequency.

Dependencies are inferred from the claim text.