Alignment fixture

An alignment fixture for aligning parts used in a wafer etching machine comprising:

• a base defining a plurality of alignment guide openings;
• at least two opposing arms carried by the base, the arms defining a central channel;
• a first ring positioned on the base and defining a plurality of first position locator guides, wherein a center of at least one of the first position locator guides is aligned with and received in the channel;
• a second ring positioned on the base adjacent the first ring, and comprising a plurality of second position locator guides, wherein at least two of the second position locator guides are aligned simultaneously with the center of at least one of the first position locator guides that is aligned respectively with the channel and at least two of the alignment guides;
• and
• a screw passing through an opening defined by the first ring contacts the first ring and second ring, and when tightened, secures the first ring and second ring together in an established positional relationship.

A method for accurately aligning parts used in a wafer etching machine comprising:

• providing a base supporting at least one first alignment guide and a plurality of complementary second alignment guides arranged in a predetermined configuration;
• placing a first member on the base, the first member comprising a plurality of first position locator guides;
• moving the first member so that a center of at least two of the first position locator guides aligns with a center of the first alignment guide;
• placing a second member on the base, the second member comprising a plurality of second position locator guides;
• moving the second member so that a center of at least one of the second position locator guide simultaneously aligns with the center of the first position locator guide aligned with the first alignment guide and at least two of the second alignment guides;
• and
• securing the first member and second member in an established positional relationship.

An alignment method for accurately aligning two concentric rings for use in a wafer etching machine comprising:

• providing a base supporting a plurality of complementary alignment guides arranged in a predetermined configuration and at least two opposing arms defining an open channel;
• placing a first ring on the base, the first ring comprising a plurality of first position locator guides;
• rotating the first ring so that a center of at least two of the first position locator guides aligns with a center of each channel;
• placing a second ring on the base adjacent the first ring, the second ring comprising a plurality of second position locator guides;
• rotating the second ring so that a center of at least one of the second position locator guides simultaneously aligns with the center of the first position locator guide aligned with each channel and a center of the alignment guides;
• and
• securing the first ring and second ring in an established positional relationship.