Exposure device, method of making and using same, and objects exposed by the exposure device
AssigneeNikon Corporation
InventorMasao Takiguchi
Life of this patent
Estimating the term…
Abstract
Even when a surface temperature of an illumination optical system becomes high, detection accuracy of a reticle alignment detection system is not negatively affected. An illumination optical system irradiates an illumination light to a mask and exposes a substrate with the illumination light through the mask. A gas supply device supplies gas, which has been cleaned, to a case in which is disposed at least part of an illumination optical system. A temperature adjusting device adjusts the temperature of the case and the temperature in the vicinity of the case.
Claims40
An exposure device comprising:
- an illumination optical system that irradiates an illumination light onto a mask to expose a substrate with the illumination light through the mask;
- a case that surrounds at least part of the illumination optical system;
- a first gas supply device that supplies a first gas into the case;
- a second gas supply device that supplies a second gas that is different from the first gas to a vicinity of the case;
- and
- a temperature adjusting device that adjusts a temperature of the first gas and a temperature of the second gas.
A method of making an exposure device comprising the steps of:
- providing an illumination optical system that irradiates an illumination light onto a mask to expose a substrate with the illumination light through the mask;
- providing a case that surrounds at least part of the illumination optical system;
- providing a first gas supply device that supplies a first gas into the case;
- providing a second gas supply system that supplies a second gas that is different from the first gas to a vicinity of the case;
- and
- providing a temperature adjusting device that adjusts a temperature of the first gas and a temperature of the second gas.
An exposure method for forming a pattern of a mask onto a substrate, the method comprising the steps of:
- irradiating an illumination light onto a mask to expose a substrate with the illumination light through the mask, the illumination light irradiated from an illumination optical system, at least part of which is surrounded by a case;
- supplying a first gas that is temperature-controlled into the case;
- and
- supplying a second gas that is temperature-controlled to an optical member that is different from the illumination optical system, the second gas being different from the first gas.
An exposure device comprising:
- an illumination optical system that irradiates an illumination light onto a mask to expose a substrate with the illumination light through the mask;
- a first gas supply device that supplies a first gas that is temperature-controlled to at least part of the illumination optical system;
- an optical member that is different from the illumination optical system;
- and
- a second gas supply device that supplies a second gas that is temperature-controlled to the optical member, the second gas being different from the first gas.
Dependencies are inferred from the claim text.