Process for manufacturing composite glass/Si substrates for microwave integrated circuit fabrication
AssigneeThe Whitaker Corporation
InventorsKevin Glenn Ressler, Jim-Yong Chi
Life of this patent
Estimating the term…
Abstract
A method of forming a glass layer on a substrate of material, for example, silicon, with the glass layer having a coefficient of thermal expansion which substantially matches the substrate. A slurry comprising glass powder and a solvent is applied to the substrate, as for example, by pouring, and a multi-step heating process is carried out with over-pressures of a highly diffusive gas such as hydrogen first, followed by a non-diffusive gas such as nitrogen to thereby create a glass layer having reduced bubbles and fewer bubbles than has heretofore been achieved.
Claims16
A process for fabricating a glass layer for use in integrated circuit, comprising the steps of:
- providing a substrate having a slurry of powdered glass mixed with a liquid solvent disposed on a surface thereof;
- within a firing chamber, establishing temperature and pressure conditions effective to aid in removal of residual solvent from said slurry to thereby obtain an unfired glass layer;
- in a first gas introducing step, introducing a first gas having a sufficiently small molecular diameter as to permit diffusion into said unfired glass layer;
- heating said glass layer to a temperature at which bubbles form in interstices between glass powder particles melting together, the gas introduced during said first gas introducing step filling the bubbles during the heating step;
- maintaining said glass layer at a temperature and pressure such that at least some of the first gas within the bubbles formed during said heating step diffuses into void free areas of the glass layer;
- in a second gas introducing step, introducing a second gas having a sufficiently large molecular diameter as to not diffuse into the glass layer and not react chemically therewith, said second gas being at a pressure effective to decrease a partial pressure of said first gas to thereby establish a concentration gradient which promotes further migration of said first gas into void free areas of the glass layer.
A process for fabricating an integrated circuit, comprising the steps of:
- providing a substrate having a slurry of powdered glass mixed with a solvent disposed on a surface thereof, said slurry constituting an unfired glass layer;
- in a first gas introducing step within a firing chamber, introducing a first gas having a sufficiently small molecular diameter as to permit diffusion into said unfired glass layer;
- heating said unfired glass layer to a temperature at which bubbles form in interstices between glass powder particles melting together to thereby obtain an intermediate glass layer, the gas introduced during said first gas introducing step filling the bubbles during the heating step;
- maintaining said intermediate glass layer at a temperature and pressure such that at least some of the first gas within the bubbles formed during said heating step diffuses into void free areas of the intermediate glass layer;
- in a second gas introducing step, introducing a second gas having a sufficiently large molecular diameter as to not diffuse into the intermediate glass layer and not react chemically therewith, said second gas being at a temperature and pressure pressure effective to decrease a partial pressure of said first gas to thereby establish a concentration gradient which promotes further migration of said first gas into void free areas of the intermediate glass layer.
Dependencies are inferred from the claim text.