Method of producing sulithographic fuses using a phase shift mask
AssigneeInternational Business Machines Corporation
InventorsKenneth C. Arndt, Louis L. Hsu, Jack A. Mandelman, K. Paul Muller
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Abstract
A method for forming an interconnect wiring structure, such as a fuse structure, comprises forming an opening in an insulating layer using a phase shift mask (the opening having vertical sidewalls sloped sidewalls and horizontal surfaces), depositing a conductive material in the opening and removing the conductive material from the sloped sidewalls and horizontal surfaces, wherein the conductive material remains on the vertical sidewalls as fuse links.
Claims20
A method of forming a fuse structure comprising:
- forming an opening in an insulating layer using a phase shift mask, said opening having vertical sidewalls, sloped sidewalls and horizontal surfaces;
- depositing a conductive material in said opening;
- and
- removing said conductive material from said sloped sidewalls and said horizontal surfaces, wherein said conductive material remains on said vertical sidewalls as fuse links.
A method of selectively connecting elements within a semiconductor structure using fuse links, said method comprising:
- forming an opening in an insulating layer using a phase shift mask, said opening having vertical sidewalls, sloped sidewalls and horizontal surfaces;
- depositing a conductive material in said opening;
- and
- removing said conductive material from said sloped sidewalls and said horizontal surfaces, wherein said conductive material remains on said vertical sidewalls as said fuse links.
A method of forming an interconnect wiring structure comprising:
- forming an opening in an insulating layer using a phase shift mask, said opening having vertical sidewalls, sloped sidewalls and horizontal surfaces;
- depositing a conductive material in said opening;
- and
- removing said conductive material from said sloped sidewalls and said horizontal surfaces, wherein said conductive material remains on said vertical sidewalls.
Dependencies are inferred from the claim text.