High conformality antireflective coating compositions
AssigneeShipley Company, L.L.C.
InventorsEdward K. Pavelchek, Manuel DoCanto, Timothy G. Adams
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Abstract
The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), particularly for deep UV applications. The antireflective compositions of the invention in general comprise a resin binder component that contains a high molecular weight polymer, e.g. a polymer having an Mw of at least about 40,000 daltons. ARCs of the invention exhibit exceptional conformality upon application to a substrate surface. For example, ARCs of the invention can coat substantial topography such as vertical and sloping steps with high conformality.
Claims15
A method for forming a photoresist relief image and a conformal antireflective composition coating layer over a substrate having topography that includes a step feature having a width of at least 0.8 microns and at least about a 2 micron mid-point depth, the method comprising:
- (a) applying, on the substrate over the step feature having a width of at least about 0.8 microns and at least about a 2 micron mid-point depth, a layer of a conformal antireflective composition that comprises a crosslinker and a polymer having a molecular weight (Mw) of about 30,000 or greater, and wherein the antireflective composition exhibits a DOC of about 0.60 or greater for a step feature having a sloping profile and a 0.8 micron width and 2 micron mid-point depth;
- (b) applying a layer of a photoresist composition over the antireflective composition layer;
- and
- (c) exposing the photoresist layer to radiation having a wavelength of less than 200 nm and developing the exposed photoresist layer.
Dependencies are inferred from the claim text.