Loading patent…
AssigneeTokyo Electron Limited
InventorKoji Harada
Estimating the term…
In this impurity eliminating apparatus, a mounting stand on which a wafer is mounted and a casing which confronts the mounting stand are provided in a container. A lower face of the casing consists of. quartz glass. Inside the casing, an irradiating body for irradiating ultraviolet rays toward the wafer on the mounting stand is provided. The casing is full of inactive gas atmosphere supplied from an inactive gas supply pipe. The atmosphere above the wafer is exhausted from one side by an exhauster. Following the treatment by the impurity eliminating apparatus with the above structure, coating treatment with a treatment solution for forming a SOG film is performed. Thus, organic substances on the surface of the wafer is eliminated to form the SOG film.
A impurity eliminating apparatus for cleaning a surface of a substrate before formation of an SOG (spin-on-glass) film, comprising:
A film forming system comprising a coating apparatus for forming an SOG (spin-on-glass) film on a substrate by supplying an SOG solution thereonto, an impurity eliminating apparatus for removing foreign matter from a surface of the substrate, and a carrier apparatus for carrying the substrate between said coating apparatus and said impurity eliminating apparatus, said impurity eliminating apparatus comprising:
Dependencies are inferred from the claim text.