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AssigneeMitsubishi Denki Kabushiki Kaisha
InventorsTakeharu Kuroiwa, Tsuyoshi Horikawa, Noboru Mikami, Tetsuro Makita
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A semiconductor memory device achieves a high capacitance value even when the elements are made extremely small as the degree of integration is increased. A method of producing such a semiconductor memory maintains a high capacitance value while achieving increased integration. A semiconductor memory device includes adjacent capacitor lower electrodes which are separated by a width of 0.2 μm while the ratio of the capacitor lower electrode height to the separation width is 1, the capacitor upper electrode covers the capacitor insulation film, and steps generated in the separated portion of the capacitor lower electrodes are filled by the upper electrode material. A method of manufacturing produces a semiconductor memory device wherein the capacitor upper electrode is formed in plasma which includes etchable gas by chemical or physical action.
A method for producing a semiconductor memory device comprising the steps of:
Dependencies are inferred from the claim text.