Mask quality measurements by fourier space analysis

A system for determining an optimal mask fabrication process, comprising:

• an input device which receives input data corresponding to a plurality of mask patterns that each approximate an ideal mask pattern, wherein the mask patterns are formed by different mask fabrication processes, and wherein the input device transmits the input data to the system, and wherein the input data represents a two-dimensional data representation of the plurality of mask patterns;
• a processor coupled to the input device, wherein the processor receives the input data from the input device and performs a Fourier transform thereon, and wherein the Fourier transform provides a two-dimensional mapping of spatial frequencies for each of the plurality of mask patterns;
• and
• a memory coupled to the processor, wherein the memory stores a metric which is based upon a capability of a pattern transfer system which will utilize one or more masks employing the plurality of mask patterns thereon, and wherein the processor accesses the memory to utilize the metric in evaluating the plurality of transformed mask patterns, wherein the metric represents a selected range of spatial frequencies which the pattern transfer system is capable of transmitting therethrough, and wherein the processor is programmed to apply the metric to the two-dimensional mapping of spatial frequencies for the plurality of mask features by integrating the two-dimensional mappings of the mask patterns over the selected range of spatial frequencies, and wherein the result of the integration is a value which indicates an amount of energy associated with the respective mask pattern which is transmitted through the pattern transfer system to the substrate, and
• wherein the processor selects one of the mask fabrication processes by selecting its associated mask pattern using the metric based upon a predetermined criteria, wherein using the metric comprises selecting the mask fabrication process associated with the mask pattern having the largest amount of energy within the selected range of spatial frequencies.

A system for determining an optimal mask fabrication process, comprising;

• an input device which receives input data corresponding to a plurality of mask patterns that each approximate an ideal mask pattern, wherein the mask patterns are formed by different mask fabrication processes, and wherein the input device transmits the input data to the system, and wherein the input data represents a two-dimensional data representation of the plurality of mask patterns;
• a processor coupled to the input device wherein the processor is programmed to perform a Wavelet transform on the input data to form a sum or product of finite, scaled and translated functions for each of the plurality of mask patterns;
• and
• a memory coupled to the processor, wherein the memory stores a metric which is based upon a capability of a pattern transfer system which will utilize one or more masks employing the plurality of mask patterns thereon, and wherein the processor accesses the memory to utilize the metric in evaluating the plurality of transformed mask patterns,
• wherein the processor selects one of the mask fabrication processes by selecting its associated mask pattern using the metric based upon a predetermined criteria.