Optical pattern transfer tool

An optical pattern transfer tool, comprising:

• a transparent layer having first and second planar surfaces lying in substantially parallel planes, first and second steps formed between the first and second planar surfaces at first and second edges, respectively, defining a width of the first planar surface;
• a plurality of opaque regions overlying the first planar surface, each of the opaque regions spaced from one another and offset from one another such that the opaque regions are alternately aligned along a length of the first planar surface, such that one of the opaque regions is aligned with a portion of the first edge and the next one of the opaque regions along the length is aligned with a portion of the second edge;
• wherein a first wordline is optically defined by the first edge and the opaque regions aligned with the first edge, and a second wordline is optically defined by the second edge and the opaque regions aligned with the second edge
• wherein an optically defined width of a feature is selectively defined by adjusting a shape of the opaque regions;
• and
• wherein a width of the optically defined width of the feature is 0.15 micrometers at 365 nanometer lithography.

An optical pattern transfer tool, comprising:

• a transparent layer having first and second planar surfaces lying in substantially parallel planes, first and second steps formed between the first and second planar surfaces at first and second edges, respectively defining a width of the first planar surface;
• a plurality of opaque regions overlying the first planar surface, each of the opaque regions spaced from one another and offset from one another such that the opaque regions are alternately aligned along a length of the first planar surface, such that one of the opaque regions is aligned with a portion of the first edge and the next one of the opaque regions along the length is aligned with a portion of the second edge;
• wherein a first wordline is optically defined by the first edge and the opaque regions aligned with the first edge, and a second wordline is optically defined by the second edge and the opaque regions aligned with the second edge;
• wherein a critical dimension of a feature is controlled by adjusting the width of the first planar surface and positioning of the opaque regions with respect to each other while alternately aligning with the steps;
• and
• wherein an optically defined distance between features is 0.20 micrometers at 365 nanometer lithography.

An optical pattern transfer tool, comprising:

• a transparent layer having first and second planar surfaces lying in substantially parallel planes, first and second steps formed between the first and second planar surfaces at first and second edges, respectively, defining a width of the first planar surface;
• a plurality of opaque regions overlying the first planar surface, each of the opaque regions spaced from one another and offset from one another such that the opaque regions are alternately aligned along a length of the first planar surface, such that one of the opaque regions is aligned with a portion of the first edge and the next one of the opaque regions along the length is aligned with a portion of the second edge;
• wherein a first wordline is optically defined by the first edge and the opaque regions aligned with the first edge, and a second wordline is optically defined by the second edge and the opaque regions aligned with the second edge;
• and
• wherein illuminated light transmitted on either side of the steps is approximately 180 degrees out of phase.

A photolithography system, comprising:

• an illuminator;
• and
• an optical pattern transfer tool having:
• a transparent layer having first and second planar surfaces lying in substantially parallel planes, first and second steps formed between the first and second planar surfaces at first and second edges, respectively, defining a width of the first planar surface;
• and
• a plurality of opaque regions overlying the first planar surface, each of the opaque regions spaced from one another and offset from one another such that the opaque regions are alternately aligned along a length of the first planar surface, such that one of the opaque regions is aligned with a portion of the first edge and the next one of the opaque regions along the length is aligned with a portion of the second edge,
• wherein the optical pattern transfer tool, in response to the illuminator, optically defines a first feature on a wafer using in combination the first edge and the opaque regions aligned with the first edge, and a second feature is optically defined on the wafer using in combination the second edge and the opaque regions aligned with the second edge;
• wherein the light from the illuminator transmitted on either side of the steps is 180±10 degrees out of phase.

A photolithography system, comprising:

• an illuminator;
• and
• an optical pattern transfer tool having:
• a transparent layer having first and second planar surfaces lying in substantially parallel planes, first and second steps formed between the first and second planar surfaces at first and second edges, respectively, defining a width of the first planar surface;
• a plurality of opaque regions overlying the first planar surface, each of the opaque regions spaced from one another and offset from one another such that the opaque regions are alternately aligned along a length of the first planar surface, such that one of the opaque regions is aligned with a portion of the first edge and the next one of the opaque regions along the length is aligned with a portion of the second edge;
• wherein the optical pattern transfer tool, in response to the illuminator, optically defines a first feature on a wafer using in combination the first edge and the opaque regions aligned with the first edge, and a second feature is optically defined on the wafer using in combination the second edge and the opaque regions aligned with the second edge;
• wherein an optically defined width of the feature is selectively defined by adjusting a shape of the opaque regions;
• and
• wherein a width of the optically defined feature is 0.15 micrometers at 365 nanometer lithography.

A computer system, the computer system comprising a memory device, the memory device including:

• an array of memory cells, each memory cell including a transistor, a capacitor, and a bit contact;
• addressing circuitry coupled to the array of memory cells via wordlines for accessing individual memory cells in the array of memory cells;
• and
• a read circuit coupled to the array of memory cells via bitlines for reading individual memory cells in the array of memory cells,
• wherein a width of the wordline is 0.15 micrometers and the distance between two adjacent wordlines is 0.2 micrometers.

A memory device, comprising:

• an array of memory cells, each memory cell including a transistor, a capacitor, and a bit contact;
• addressing circuitry coupled to the array of memory cells via wordlines for accessing individual memory cells in the array of memory cells;
• and
• a read circuit coupled to the array of memory cells via bitlines for reading individual memory cells in the array of memory cells;
• wherein a width of the wordline is 0.15 micrometers and the distance between two adjacent wordlines is 0.2 micrometers.

An optical pattern transfer tool, comprising:

• a transparent layer having first and second planar surfaces lying in substantially parallel planes, first and second steps formed between the first and second planar surfaces at first and second edges, respectively, defining a width of the first planar surface;
• a plurality of opaque regions overlying the first planar surface, each of the opaque regions spaced from one another and offset from one another such that the opaque regions are alternately aligned along a length of the first planar surface, such that one of the opaque regions is aligned with a portion of the first edge and the next one of the opaque regions along the length is aligned with a portion of the second edge,
• wherein a first feature is optically defined by the first edge and the opaque regions aligned with the first edge, and a second feature is optically defined by the second edge and the opaque regions aligned with the second edge;
• wherein an optically defined width of the first and second features is selectively defined by adjusting a shape of the opaque regions wherein illuminated light transmitted on either side of the steps is 180±10 degrees out of phase.

A photolithography system, comprising:

• an illuminator;
• and
• an optical pattern transfer tool having:
• a transparent layer having first and second planar surfaces lying in substantially parallel planes, first and second steps formed between the first and second planar surfaces at first and second edges, respectively, defining a width of the first planar surface;
• and
• a plurality of opaque regions overlying a portion of the first planar surface, each of the opaque regions spaced from one another and offset from one another such that the opaque regions are alternately aligned along a length of the first planar surface, such that one of the opaque regions is aligned with a portion of the first edge and the next one of the opaque regions along the length is aligned with a portion of the second edge wherein illuminated light transmitted on either side of the steps is 180±10 degrees out of phase.

A photolithography system, comprising:

• an illuminator;
• and
• an optical pattern transfer tool having:
• a transparent layer having first and second planar surfaces lying in substantially parallel planes, first and second steps formed between the first and second planar surfaces at first and second edges, respectively, defining a width of the first planar surface such that light from an illuminator transmitted through the transparent layer on either side of the steps is approximately 180±10 degrees out of phase;
• and
• a plurality of opaque regions overlying a portion of the first planar surface, each of the opaque regions spaced from one another and offset from one another such that the opaque regions are alternately aligned along a length of the first planar surface, such that one of the opaque regions is aligned with a portion of the first edge and the next one of the opaque regions along the length is aligned with a portion of the second edge.