Method and apparatus for the disposal of processing fluid used to deposit and/or remove material on a substrate

An apparatus for processing a substrate residing therein comprising:

• a hollow sleeve for forming a containment chamber to contain a processing fluid for processing said substrate, said sleeve having a lower end and an upper end;
• a support for having said substrate reside thereon;
• said support engaging said sleeve when raised and causing said substrate to enclose said lower end of said sleeve to form said containment chamber for retaining said processing fluid therein;
• a first electrode coupled to said sleeve;
• at least one second electrode coupled to said sleeve;
• said at least one second electrode contacting a surface of said substrate exposed to said processing fluid such that said substrate is subjected to an electric field generated by a potential difference between said first electrode and said at least one second electrode;
• and,
• a containment ring coupled to said hollow sleeve;
• wherein said substrate and said lower end form an opening therebetween for diverting said processing fluid into said containment ring when said substrate is disengaged from said lower end.