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US 6,180,319 B2Granted
Process for the continuous liquid processing of photosensitive compositions having reduced levels of residues
AssigneeE. I. Du Pont de Nemours and Company
InventorMark R. McKeever
Life of this patent
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Abstract
Minimization of developed photosensitive compositions is realized through use of a photoinitiator of hexaarylbiimidazole compound having at least one hydrophilic group.
Claims19
A process for the continuous development of photoresist compositions, comprising the steps:
- (a) applying an aqueous-developable photoresist to a surface of a first substrate, said photoresist comprising a photoinitiator;
- (b) imagewise exposing to actinic radiation to produce exposed and non-exposed areas in the photoresist;
- (c) treating the imagewise exposed photoresist with a sample of aqueous alkaline solution, said solution containing less than 5% by weight organic content, resulting in removal of either the exposed or the non-exposed areas of the photoresist;
- and
- (d) repeating steps (a) to (c) at least 5 times, wherein each repetition uses a new sample of photoresist and a new substrate and essentially the same sample of aqueous alkaline solution;
- wherein the photoinitiator comprises at least one hexaarylbiimidazole compound having at least one hydrophilic group, and wherein treatment of 3 grams of unexposed photoresist with 100 grams of the aqueous alkaline solution produces less than 0.05 grams sludge.
3 more elements
A process for removing a pattern of processed photoresist from a substrate, said process comprising the steps:
- (a) treating the processed photoresist with a sample of a stripper solution, resulting in removal of the processed photoresist;
- and
- (b) repeating step (a) at least 5 times, wherein each repetition uses a new substrate and processed photoresist and essentially the same sample of stripper solution;
- wherein the photoresist comprises at least one hexaarylbiimidazole compound having at least one hydrophilic group, and wherein treatment of 3 grams of processed photoresist with 100 grams of the stripper solution produces less than 0.05 grams sludge.
1 more element
Dependencies are inferred from the claim text.