Inspection method and apparatus for projection optical systems

A projection exposure method in which an image of a pattern formed on a mask is projected onto a substrate through a projection system, the method comprising:

• detecting a reference mark of a reference mark member through the projection system, wherein said reference mark member is formed on a mask stage which holds said mask and is different from said a mask;
• and
• obtaining an image formation characteristic on the basis of information obtained by detecting said reference mark,
• wherein the image formation characteristic is obtained in accord with an illumination condition for a mask.

A projection exposure method in which an image of a pattern formed on a mask is projected onto a substrate through a projection system, the method comprising:

• projecting an image of a reference mark formed on a reference mark member through the projection system, wherein said reference mark member is formed on a mask stage which holds said mask and is different from said mask;
• exposing a substrate with the projection image of the reference mark;
• detecting a resist image formed on the substrate;
• and
• obtaining an image formation characteristic on the basis of information obtained by detecting the resist image.

A projection exposure method in which an image of a pattern formed on a mask is projected onto a substrate through a projection system, the method comprising:

• projecting an image of a reference mark formed on a reference mark member through the projection system, wherein said reference mark member is formed on a mask stage which holds said mask and is different from said mask;
• forming the projected image of the reference mark on an erasable device;
• detecting an image formed on the erasable device;
• and
• obtaining an image formation characteristic on the basis of information obtained by detecting said image formed on the erasable device.

A scanning exposure method in which a mask and a substrate are moved synchronously for a scanning exposure, the method comprising:

• moving a reference member to a predetermined position, wherein said reference member is disposed on a mask stage which holds said mask and is arranged within an approach run section of said mask stage;
• and
• detecting a reference mark formed on said reference member moved to the predetermined position,
• wherein said approach run section of said mask stage is passed through an illumination area of exposure light at the time of acceleration or deceleration movement of said mask stage for the scanning exposure.

A method for making a projection exposure apparatus which transfers a pattern formed on a mask onto a substrate, the method comprising:

• providing a projection optical system, disposed between said mask and said substrate, which projects a pattern image on the image plane side thereof;
• providing a mask stage, disposed on the object plane side of said projection optical system, which supports said mask;
• providing a reference mark member, disposed on said mask stage, which has a reference mark and is different from said mask,
• wherein an image of said reference mark is formed on a sensitive member through said projection optical system.

A method for making a scanning exposure apparatus which transfers a pattern formed on a mask onto a substrate through a projection system by synchronously moving said substrate and said mask in respective scanning directions, the method comprising:

• providing a mask stage, disposed on the object plane side of said projection system, which is movable in said scanning direction while holding said mask;
• and
• providing a reference mark member, disposed on said mask stage and arranged within an approach run section of said mask stage, which has a reference mark,
• wherein said approach run section of said mask stage is passed through an illumination area of an exposure light at the time of acceleration or deceleration movement of said mask stage.

A method for making a projection exposure apparatus which transfers a pattern formed on a mask onto a substrate through a projection optical system, the method comprising:

• providing a projection optical system, disposed between said mask and said substrate, which projects an image of said pattern onto said substrate;
• providing a mask stage, disposed on the object plane side of said projection optical system, which supports said mask;
• providing a reference mark member, disposed on said mask stage, which has a reference mark and is different from said mask;
• and
• providing a driving device, connected to said reference mark member, which moves said reference mark member with respect to said mask stage.

A method for making a projection exposure apparatus in which an image of a pattern formed on a mask is projected onto a substrate through a projection system, the method comprising:

• providing a mask stage, disposed on the object plane side of said projection system, which holds said mask;
• providing a reference mark member disposed on said mask stage, which has a reference mark;
• and
• providing a detecting system which detects the reference mark of said reference mark member through the projection system to obtain an image formation characteristic other than a projection magnification and distortion.