Method of fabricating small dimension wires

A method of fabricating small dimension wires formed on a substrate comprising an insulation layer, wherein a first conductive layer is on the insulation layer, and a second conductive layer is on the first conductive layer the method comprising the steps of:

• patterning the second conductive layer to form a first wire pattern, the resulting first wire pattern being substantially free from photoresist;
• minifying the first wire pattern;
• and
• etching the first conductive layer with the first wire pattern as a mask until the insulation layer is exposed.

A method for fabricating a bit line structure, wherein a substrate comprising an insulation layer formed thereon is provided, comprising:

• forming a plurality of conductive layers for the bit line structure on the insulation layer;
• patterning a first conductive layer of the bit line structure, the resulting patterned first conductive layer being substantially free from photoresist;
• dipping the first conductive layer of the bit line structure in a solution of ammonia and hydrogen peroxide;
• and
• etching the second conductive layer of the bit line structure using the first conductive layer as a mask.