US 6,149,728 A · Semiconductor manufacturing device

Abstract

A semiconductor manufacturing device uniformly grows a film on the surface of a wafer and reduces a turnaround time by shortening the time per process unit. The device includes a chamber, a plurality of lamps disposed on the upper end of the chamber to heat the wafer, and a plurality of pyrometers for supporting the wafer inserted into the wafer, detecting the inner temperature of the chamber and supporting the wafer onto a heat board as the wafer is heating to a predetermined temperature. The device further includes the heat board disposed on the lower end of the chamber to hold thereon the wafer lowered by the pyrometers and to keep the processing temperature, a wafer inlet or outlet formed on one side of the chamber, and reaction gas inlet and outlet formed on both sides of the chamber for injecting the reaction gas for growing the film on the wafer as the wafer is lowered onto the heat board.

Claims22

Dependent claims

A semiconductor manufacturing device for growing a film on a wafer, comprising:

a chamber having a plurality of openings;
a first heat source disposed on an upper portion of the chamber;
a second heat source disposed on a lower portion of the chamber for placing the wafer thereon and for uniformly heating the wafer;
and
at least one temperature detector for detecting a temperature of the chamber and being movable between the first and second heat sources,
wherein the at least one temperature detector includes a plurality of pyrometers for supporting the wafer near the first heat source.

3 more elements

Dependencies are inferred from the claim text.

Semiconductor manufacturing device

Life of this patent

Semiconductor manufacturing device

Life of this patent

Abstract

Claims22