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US 6,148,763 AGranted
Deposited film forming apparatus
AssigneeCanon Kabushiki Kaisha
InventorsKazuyoshi Akiyama, Toshiyasu Shirasuna, Kazuhiko Takada, Ryuji Okamura, Hitoshi Murayama
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Abstract
In a deposited film forming apparatus, at least part of the inner wall surfaces of a reactor or surfaces of structural component parts on which films are deposited is constituted of a porous ceramic material. This can prevent film come-off of deposited films on inner walls and structural component parts of the reactor as far as possible so that the spherical protuberances can be prevented from occurring and electrophotographic photosensitive members having a superior quality can be formed.
Claims10
A deposited film forming apparatus comprising:
- a means for introducing at least high-frequency power to the inside of a reactor;
- a means for feeding a material gas into the reactor;
- and
- a substrate supporting means for supporting a substrate on which a deposited film is to be formed, the deposited film being formed on the substrate by applying the high-frequency power thereon to cause glow discharge to take place to decompose the material gas;
- wherein at least part of the inner wall surfaces of the reactor or surfaces of structural component parts on which films are deposited is constituted of a porous ceramic material, the porosity of which extends throughout the ceramic material;
- and
- wherein the porous ceramic material has an average pore diameter of from 1 .mu.m to 150 .mu.m and an apparent porosity of from 10% to 39%.
4 more elements
Dependencies are inferred from the claim text.